Meng-Feng Tsai
Assistant Manager at SCH Electronics Co Ltd
SPIE Involvement:
Publications (6)

Proceedings Article | 29 March 2013 Paper
Wan-Lin Kuo, Ya-Ting Chan, Meng-Feng Tsai, Yi-Shiang Chang, Chia-Chi Lin, Ming-Chien Chiu, Chun-Hsun Chen, Hung-Ming Wu, Mao-Hsing Chiu
Proceedings Volume 8682, 86821G (2013)
KEYWORDS: Etching, Chemical reactions, Scanning electron microscopy, Optical lithography, Image processing, Double patterning technology, Photoresist processing, Lithography, Photomasks, Process control

Proceedings Article | 16 April 2011 Paper
Meng-Feng Tsai, Yang-Liang Li, Chan-Tsun Wu, Yi-Shiang Chang, Chia-Chi Lin
Proceedings Volume 7972, 79721B (2011)
KEYWORDS: Photomasks, Photoresist processing, Double patterning technology, Semiconducting wafers, Lithography, Printing, Etching, Critical dimension metrology, Line width roughness, Optical alignment

Proceedings Article | 4 March 2010 Paper
Meng-Feng Tsai, Chia-Chi Lin, Wei-Chun Chao, Chan-Tsun Wu, Jun-Cheng Lai
Proceedings Volume 7640, 76403H (2010)
KEYWORDS: Reflectivity, Reflection, Lithography, Resolution enhancement technologies, Optical proximity correction, Bottom antireflective coatings, Photoresist processing, Carbon, Lithographic illumination, Double patterning technology

Proceedings Article | 23 March 2009 Paper
Proceedings Volume 7272, 72721Q (2009)
KEYWORDS: Optical alignment, Overlay metrology, Signal processing, Double patterning technology, Photomasks, Etching, Optical lithography, Semiconducting wafers, Manufacturing, Scanners

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72743E (2009)
KEYWORDS: Photomasks, Double patterning technology, Etching, Lithography, Semiconducting wafers, Manufacturing, Electron beam lithography, Bridges, Optical alignment, Scanners

Showing 5 of 6 publications
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