Meng H. Lee
Director, Marketing at Veeco Instruments Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 18 December 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, EUV optics, Ion beams, Manufacturing

Proceedings Article | 15 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Extreme ultraviolet, Multilayers, Reflectivity, Molybdenum, Silicon, Mirrors, Ion beams, X-rays, Spectroscopy, Transmission electron microscopy

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Silicon, Molybdenum, Multilayers, Extreme ultraviolet, Atomic force microscopy, Photomasks, Surface roughness, Ion beams, Reflectivity, Interfaces

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Ions, Ruthenium, Ion beams, Nickel, Palladium, Optical lithography, Extreme ultraviolet, Platinum, Xenon

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Etching, Ion beams, Photomasks, Extreme ultraviolet, Nickel, Optical lithography, Ruthenium, Critical dimension metrology, Ions, Cobalt

Showing 5 of 6 publications
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