Meng H. Lee
Director, Marketing at Veeco Instruments Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Multilayers, Interfaces, Silicon, Reflectivity, Surface roughness, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet, Molybdenum

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Optical lithography, Etching, Nickel, Ions, Platinum, Xenon, Ion beams, Extreme ultraviolet, Palladium, Ruthenium

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Etching, Nickel, Ions, Cobalt, Ion beams, Photomasks, Extreme ultraviolet, Critical dimension metrology, Ruthenium

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Multilayers, Optical lithography, Etching, Nickel, Ions, Photoresist materials, Ion beams, Photomasks, Extreme ultraviolet, Ruthenium

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