Dr. Mewael Giday Sertsu
Research Fellow at HZB Berlin
SPIE Involvement:
Area of Expertise:
Thin film and multilayer coatings , EUV and X-ray optics , EUV scattering as a surface technique , Vacuum instrumentation , Radiation damage analysis , Nanomagnetics on hetrostructure multilayers
Profile Summary

I studies Physics and Photonics in my bachelor and masters programs. After 3 years of physics undergraduate teaching, I pursued a PhD research on EUV and X-ray optics. I have done research on thin film and multilayer coatings of high reflectivity performances in EUV and soft X-ray wavelengths. A major task ,however, was to come up with sensitive and reliable metrology techniques to characterize the interdiffuion of multilayers. A grazing incidence based EUV reflectometry was proposed as robust technique to derive structural, optical and chemical properties interdiffuion layers in multilayers.

Deposition of B4C/Ceo2 MLs to study the performance as a possible candidate for the 6.x nm beyond EUV lithogrpahy was performed. optical properties of ceo2 determined experimentally in this range for the first time, interdiffusion of B4C/Ceo2 investigated, and ways of optimizing deposition of such combinations are reccommended for future work. I have worked also on tabletop EUV scattering experiments as surface techniques based on high-brightness DPP sources. A prototype of such tabletop EUV scattering was attempted to study surface morphology of nanostructures non-destructively and with fast scanning.

Research interests:
- X-ray absorption spectroscopies
- development of magnetic hetrostructure thin films and studying the impacts of interface diffusion , layer thicknesses and depsition qualities on the magnetic properties
- Coating and characterization of oxides
- EUV and X-ray optics related in general
- irradiation damage analysis of thin films or nano structures
Publications (6)

PROCEEDINGS ARTICLE | September 7, 2017
Proc. SPIE. 10385, Advances in Metrology for X-Ray and EUV Optics VII
KEYWORDS: Carbon, Metrology, X-rays, X-ray optics, Optical components, Contamination, Reflectometry, Synchrotron radiation, Scanning tunneling microscopy, Reflectivity

Proc. SPIE. 9510, EUV and X-ray Optics: Synergy between Laboratory and Space IV
KEYWORDS: Reflectivity, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Boron, Multilayers, Interfaces, X-rays, Diffusion, Grazing incidence

Proc. SPIE. 9511, Damage to VUV, EUV, and X-ray Optics V
KEYWORDS: Ions, Reflectivity, Silicon, Extreme ultraviolet, Grazing incidence, Sun, Molybdenum, X-rays, Solar processes, Solar energy

Proc. SPIE. 9510, EUV and X-ray Optics: Synergy between Laboratory and Space IV
KEYWORDS: Thin films, Reflectivity, Extreme ultraviolet, X-rays, Surface roughness, Titanium, Refractive index, Silicon, X-ray optics, Titanium dioxide

PROCEEDINGS ARTICLE | September 26, 2013
Proc. SPIE. 8862, Solar Physics and Space Weather Instrumentation V
KEYWORDS: Reflectivity, Optical coatings, Particles, Extreme ultraviolet, Nanostructures, Ultraviolet radiation, Multilayers, Solar energy, Coronagraphy, Mirrors

PROCEEDINGS ARTICLE | September 26, 2013
Proc. SPIE. 8861, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VI
KEYWORDS: Reflectivity, Silicon, Molybdenum, Extreme ultraviolet, Interfaces, Absorption, X-rays, Chemical species, Grazing incidence, Scattering

Showing 5 of 6 publications
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