Mi-Rim Jung
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 30 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Modulation, Polarization, Image segmentation, Manufacturing, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Overlay metrology, Personal protective equipment, Resolution enhancement technologies

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Lithography, Reticles, Metrology, Optical lithography, Etching, Optical proximity correction, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Mathematical modeling, Thin films, Lithography, Glasses, Interfaces, Optical proximity correction, Critical dimension metrology, Motion models, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Coherence imaging, Refractive index, Lithographic illumination, Polarization, Image quality, Photomasks, Immersion lithography, Modulation transfer functions, Resolution enhancement technologies, Liquids

Showing 5 of 6 publications
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