Dr. Michael E. Adel
Researcher at KLA-Tencor Israel
SPIE Involvement:
Conference Program Committee | Author
Publications (32)

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Modulation, Polarization, Image segmentation, Manufacturing, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Statistical analysis, Image segmentation, Manufacturing, Scanning electron microscopy, Process control, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Photovoltaics, Metrology, Diffractive optical elements, Detection and tracking algorithms, Optical properties, Etching, Scatterometry, Signal processing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Overlay metrology, Personal protective equipment, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Optical design, Light sources, Metrology, Polarization, Inspection, Reflectivity, Interference (communication), Scatterometry, Semiconducting wafers, Electromagnetic simulation, Overlay metrology, Device simulation

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Image processing, Optical testing, Scatterometry, Optical metrology, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Wafer testing, Overlay metrology, Device simulation, Diffraction gratings

Showing 5 of 32 publications
Conference Committee Involvement (1)
Metrology, Inspection, and Process Control for Microlithography XXIII
23 February 2009 | San Jose, California, United States
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