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Michael P. Alexander
at Entegris Inc
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Publications (1)
Proceedings Article | 16 June 2003 Paper
New approach to measurement of photoactive deep-UV optics contaminants at sub parts-per-trillion levels
Chris Atkinson, Jeff Hanson, Oleg Kishkovich, Michael Alexander, Anatoly Grayfer
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504574
KEYWORDS: Contamination, Optics manufacturing, Deep ultraviolet, Optical components, UV optics, 193nm lithography, Lithography, Optical filters, Statistical analysis, Calibration
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