Dr. Michael J. Anderson
Optical Engineer at DuPont Electronics & Industrial
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 2 June 2003 Paper
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.488485
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scatterometry, Manufacturing, Metrology, Tolerancing, Databases, Lithography, Materials processing, Scanning electron microscopy

Proceedings Article | 16 July 2002 Paper
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473462
KEYWORDS: Semiconducting wafers, Mass attenuation coefficient, Manufacturing, Error analysis, Metrology, Tolerancing, Absorbance, Statistical analysis, Optical testing, Analytical research

Proceedings Article | 21 May 1996 Paper
Michael Anderson, Susan Bablouzian, Michael Gaudet, Linda Kenyon, Pamela Turci
Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240083
KEYWORDS: Particles, Semiconducting wafers, Dye lasers, Photoresist materials, Laser scattering, Photoresist processing, Liquids, Manufacturing, Coating, Scattering

Conference Committee Involvement (6)
Metrology, Inspection, and Process Control for Microlithography XXII
25 February 2008 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXI
26 February 2007 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XX
20 February 2006 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XIX
28 February 2005 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XVIII
23 February 2004 | Santa Clara, California, United States
Showing 5 of 6 Conference Committees
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