Michael D. Archuletta
Manager, Sales & Marketing at Bruker RMR
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Photomasks, Extreme ultraviolet, Atomic force microscopy, Inspection, Printing, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts, Manufacturing, Calibration

Proceedings Article | 30 June 2012 Paper
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Nanoparticles, Photomasks, Particles, Inspection, Atomic force microscopy, Contamination, Mathematical modeling, Nanotechnology, Defect inspection, Metrology

Proceedings Article | 17 April 2012 Paper
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Air contamination, Photomasks, Pellicles, Particles, Reticles, Semiconducting wafers, Image processing, Lithography, Inspection, Quartz

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Photomasks, Atomic force microscopy, Source mask optimization, Manufacturing, Reticles, Lithography, Computational lithography, Optimization (mathematics), Opacity, Resolution enhancement technologies

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Photomasks, Deep ultraviolet, Opacity, Pellicles, Femtosecond phenomena, Quartz, Image transmission, Critical dimension metrology, Manufacturing, Chromium

Showing 5 of 16 publications
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