Michael Asturias
Application Engineer at Intel Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 21 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beam lithography, Diffusion, Monte Carlo methods, Data processing, Photomasks, Optical proximity correction, Raster graphics, Computer aided design, Semiconducting wafers, Vestigial sideband modulation

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Metrology, Manufacturing, Inspection, Computer simulations, Data processing, Photomasks, Data conversion, Semiconducting wafers, Standards development, Vestigial sideband modulation

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