Dr. Michael J. Bohan
Sr. Optics Design Engineer at Applied Materials Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 16 June 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Reticles, Deep ultraviolet, Metals, Manufacturing, Control systems, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Mirrors, Reticles, Deep ultraviolet, Photomasks, Servomechanisms, Artificial intelligence, Semiconducting wafers, Signal detection, Vestigial sideband modulation

Proceedings Article | 11 March 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Deep ultraviolet, Crystals, Germanium, Composites, Printing, Photomasks, Laser crystals, Critical dimension metrology, Bragg cells

Proceedings Article | 17 May 1994
Proc. SPIE. 2197, Optical/Laser Microlithography VII
KEYWORDS: Metrology, Cameras, Etching, Error analysis, CCD cameras, Printing, Photomasks, Optical alignment, Tolerancing, Overlay metrology

Proceedings Article | 1 June 1990
Proc. SPIE. 1264, Optical/Laser Microlithography III
KEYWORDS: Wafer-level optics, Mirrors, Beam splitters, Reticles, Optical lithography, Calibration, Diffusers, Optical alignment, Semiconducting wafers, Overlay metrology

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