Michael J. Boruszewski
at Univ of Wisconsin Madison
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electron beam lithography, Metrology, Etching, Image processing, 3D modeling, Photomasks, Mask making, Picosecond phenomena, Silicon carbide, Projection lithography

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