Dr. Michael P. Chrisp
at MIT Lincoln Lab
SPIE Involvement:
Author
Publications (20)

SPIE Journal Paper | 19 November 2019
JM3 Vol. 18 Issue 04
KEYWORDS: Photomasks, Optical lithography, Etching, Microsystems, Grayscale lithography, Device simulation, Photoresist processing, Photoresist materials, Liquids, Lithography

Proceedings Article | 23 October 2018
Proc. SPIE. 10780, Multispectral, Hyperspectral, and Ultraspectral Remote Sensing Technology, Techniques and Applications VII
KEYWORDS: Staring arrays, Signal to noise ratio, Lithography, Mirrors, Optical design, Optical lithography, Spectroscopy, Manufacturing, Reflectivity, Optics manufacturing

Proceedings Article | 27 November 2017
Proc. SPIE. 10590, International Optical Design Conference 2017
KEYWORDS: Telescopes, Mirrors, Optical design, Sensors, Reflectivity, Aspheric lenses, Spatial resolution, Reflector telescopes, Telescope design, Optical instrument design

Proceedings Article | 22 August 2017
Proc. SPIE. 10377, Optical System Alignment, Tolerancing, and Verification XI
KEYWORDS: Telescopes, Optical design, Cameras, Sensors, Satellites, Exoplanets, Optical fabrication, Space telescopes, Optical alignment, Assembly tolerances

Proceedings Article | 27 September 2016
Proc. SPIE. 9951, Optical System Alignment, Tolerancing, and Verification X
KEYWORDS: Lenses, Sensors, Interferometry, Wavefronts, Optical fabrication, Aspheric lenses, Optical alignment, Tolerancing, Assembly tolerances, Cryogenics

Showing 5 of 20 publications
Conference Committee Involvement (4)
Current Developments in Lens Design and Optical Engineering XI; and Advances in Thin Film Coatings VI
1 August 2010 | San Diego, California, United States
Current Developments in Lens Design and Optical Engineering X
4 August 2009 | San Diego, California, United States
Current Developments in Lens Design and Optical Engineering IX
11 August 2008 | San Diego, California, United States
Space Instrumentation and Dual-Use Technologies
4 April 1994 | Orlando, FL, United States
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