Michael J. Cicoria
at Northrop Grumman Corp
SPIE Involvement:
Publications (5)

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9049, 904909 (2014) https://doi.org/10.1117/12.2046462
KEYWORDS: Etching, Silicon, Polymethylmethacrylate, Semiconducting wafers, Scatterometry, Image processing, 3D modeling, Line edge roughness, Defect detection, Directed self assembly

Proceedings Article | 27 March 2014 Paper
Richard Farrell, Erik Hosler, Gerard Schmid, Ji Xu, Moshe Preil, Vinayak Rastogi, Nihar Mohanty, Kaushik Kumar, Michael Cicoria, David Hetzer, Anton DeVilliers
Proceedings Volume 9051, 90510Z (2014) https://doi.org/10.1117/12.2048396
KEYWORDS: Polymethylmethacrylate, Optical lithography, Photoresist materials, Line edge roughness, Etching, Line width roughness, Picosecond phenomena, Scanning electron microscopy, Annealing, Directed self assembly

Proceedings Article | 29 March 2013 Paper
Proceedings Volume 8682, 86820E (2013) https://doi.org/10.1117/12.2011506
KEYWORDS: Etching, Lithography, Photoresist processing, Critical dimension metrology, Semiconducting wafers, Line width roughness, Line edge roughness, Scanning electron microscopy, Double patterning technology, Chemical reactions

Proceedings Article | 26 March 2013 Paper
Proceedings Volume 8680, 86801G (2013) https://doi.org/10.1117/12.2011610
KEYWORDS: Critical dimension metrology, Etching, Line width roughness, Semiconducting wafers, Optical lithography, Lithography, Chemical reactions, Photoresist processing, Polymethylmethacrylate, Directed self assembly

Proceedings Article | 26 March 2013 Paper
Gerard Schmid, Richard Farrell, Ji Xu, Chanro Park, Moshe Preil, Vidhya Chakrapani, Nihar Mohanty, Akiteru Ko, Michael Cicoria, David Hetzer, Mark Somervell, Benjamen Rathsack
Proceedings Volume 8680, 86801F (2013) https://doi.org/10.1117/12.2011607
KEYWORDS: Optical lithography, Etching, Silicon, Photoresist materials, Finite element methods, Picosecond phenomena, Coating, Polymethylmethacrylate, Lithography, Directed self assembly

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