Dr. Michael Crouse
Lithography Development Engineer
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: SRAF, Resolution enhancement technologies, Logic, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, Line edge roughness, Nanoimprint lithography, Stochastic processes, Semiconducting wafers

Proceedings Article | 18 March 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Scanners, Optical proximity correction, Source mask optimization, Process modeling, Logic, Photomasks, Semiconducting wafers, Optical lithography, Lithography, Etching

Proceedings Article | 22 February 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Reticles, Semiconducting wafers, Source mask optimization, Monochromatic aberrations, Lithography, Calibration, Photomasks, Critical dimension metrology, Device simulation, Overlay metrology

Proceedings Article | 18 May 2011
Proc. SPIE. 8070, Metamaterials VI
KEYWORDS: Metamaterials, Semiconducting wafers, Solar cells, Annealing, Metals, Silicon, Resistance, Oxygen, Photoresist materials, Optical fabrication

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Semiconducting wafers, Overlay metrology, Optical alignment, Silicon, Scanners, Scanning electron microscopy, Critical dimension metrology, Data modeling, Manufacturing, Double patterning technology

Showing 5 of 15 publications
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