Michael P. Duane
SMTS at Applied Materials Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 4, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Logic, Optical lithography, Etching, Image processing, Dielectrics, Chemical vapor deposition, Photomasks, Transistors, Double patterning technology, Semiconducting wafers

PROCEEDINGS ARTICLE | June 16, 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Reticles, Deep ultraviolet, Metals, Manufacturing, Control systems, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Manufacturing, Diagnostics, Photomasks, Optical proximity correction, Semiconducting wafers, Failure analysis, Vestigial sideband modulation, Resolution enhancement technologies, Design for manufacturability

PROCEEDINGS ARTICLE | May 3, 2004
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Metrology, Metals, Scanners, Manufacturing, Resistance, Photomasks, Optical proximity correction, Resistors, Semiconducting wafers

PROCEEDINGS ARTICLE | May 3, 2004
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Metals, Copper, Dielectrics, Manufacturing, Resistance, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

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