Dr. Michael Fritze
Program Manager at Defense Advanced Research Projects Agency
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Optical lithography, Image resolution, Photoresist materials, Photomasks, Maskless lithography, Critical dimension metrology, Binary data, Hybrid optics, Projection lithography

Proceedings Article | 3 May 2004
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Optical lithography, Image compression, Spatial frequencies, Manufacturing, Photomasks, Optical proximity correction, Electronic design automation, Resolution enhancement technologies, Phase shifts

Proceedings Article | 29 December 2003
Proc. SPIE. 5184, Physics, Theory, and Applications of Periodic Structures in Optics II
KEYWORDS: Diffraction, Optical design, Polarization, Etching, Crystals, Silicon, Manufacturing, Wavelength division multiplexing, Aluminum, Diffraction gratings

Proceedings Article | 10 July 2003
Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing
KEYWORDS: Wafer-level optics, Lithography, Spatial frequencies, Photomasks, Optical proximity correction, Computer aided design, Neodymium, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Optical lithography, Etching, Image processing, Photomasks, Transistors, Optical proximity correction, Line edge roughness, Photoresist processing, Phase shifts, Oxidation

SPIE Journal Paper | 1 October 2002
JM3 Vol. 1 Issue 03
KEYWORDS: Photomasks, Lithography, Phase shifts, Image processing, Optical proximity correction, Semiconducting wafers, Optical lithography, Inspection, Binary data, System on a chip

Showing 5 of 17 publications
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