Dr. Michael Goldstein
Sr. Principal Physicist at SUNY Poly SEMATECH
SPIE Involvement:
Conference Program Committee | Author
Publications (19)

PROCEEDINGS ARTICLE | October 29, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Logic, Scanners, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

SPIE Journal Paper | October 27, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing

PROCEEDINGS ARTICLE | April 24, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, Metrology, Scanners, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, System integration, Prototyping

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Reticles, Optical lithography, Cameras, Sensors, Wavefronts, Projection systems, Extreme ultraviolet, Artificial intelligence, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Mirrors, Metrology, Optical coatings, Wavefronts, Optical fabrication, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, X-ray optics, Sensors, Wavefront sensors, Wavefronts, Optical testing, Zernike polynomials, Photomasks, Artificial intelligence, Prototyping

Showing 5 of 19 publications
Conference Committee Involvement (11)
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Showing 5 of 11 published special sections
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