Michael Har-Zvi
Product Marketing Manager at KLA Israel
SPIE Involvement:
Publications (12)

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 1295530 (2024) https://doi.org/10.1117/12.3010703
KEYWORDS: Metrology, Overlay metrology, Inspection, Design, Optical parametric oscillators, Design rules, Semiconducting wafers, Scanners, Etching, Diffractive optical elements

Proceedings Article | 18 April 2013 Paper
Dana Klein, Eran Amit, Guy Cohen, Nuriel Amir, Michael Har-Zvi, Chin-Chou Kevin Huang, Ramkumar Karur-Shanmugam, Bill Pierson, Cindy Kato, Hiroyuki Kurita
Proceedings Volume 8681, 86811J (2013) https://doi.org/10.1117/12.2011454
KEYWORDS: Target detection, Semiconducting wafers, Overlay metrology, Yield improvement, Metrology, Calibration, Error analysis, Semiconductors, Manufacturing, Lithography

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 86811G (2013) https://doi.org/10.1117/12.2011416
KEYWORDS: Calibration, Overlay metrology, Metrology, Semiconducting wafers, Optical filters, Neodymium, Time metrology, Process control, Ions, Data modeling

Proceedings Article | 24 March 2006 Paper
Tom Zhong, Daniel Liu, Amit Moran, Michael Levkovitch, Michael Har-Zvi, Bob Burkhardt
Proceedings Volume 6152, 61522L (2006) https://doi.org/10.1117/12.659739
KEYWORDS: Critical dimension metrology, Resistance, Magnetism, Process control, Metrology, Semiconducting wafers, Algorithm development, Mobile devices, Cell phones, Consumer electronics

Proceedings Article | 10 May 2005 Paper
Benjamin Bunday, Di Michelson, John Allgair, Aviram Tam, David Chase-Colin, Asaf Dajczman, Ofer Adan, Michael Har-Zvi
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600133
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Process control, Metrology, Etching, Cadmium, Lithography, Line width roughness, Statistical analysis

Showing 5 of 12 publications
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