Dr. Michael Hibbs
Senior Engineer
SPIE Involvement:
Publications (35)

SPIE Journal Paper | 9 June 2016
JM3, Vol. 15, Issue 02, 021410, (June 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021410
KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Image registration, Birefringence, Pulsed laser operation, Inspection, Calibration, Metrology, Overlay metrology

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 963511 (2015) https://doi.org/10.1117/12.2197729
KEYWORDS: Inspection, Photomasks, Reticles, Defect detection, Semiconducting wafers, Optical proximity correction, Databases, Lithography, SRAF, Printing

Proceedings Article | 8 October 2014 Paper
Proceedings Volume 9235, 923516 (2014) https://doi.org/10.1117/12.2069787
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Image processing, Inspection, Printing, Scanning electron microscopy, Multilayers, Lithography, Mask making

Proceedings Article | 1 October 2013 Paper
A. Zweber, A. McGuire, M. Hibbs, S. Nash, K. Ballman, T. Faure, J. Rankin, T. Isogawa, T. Senna, Y. Negishi, M. Miller, S. Barai, D. Dechene
Proceedings Volume 8880, 88800P (2013) https://doi.org/10.1117/12.2028909
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Data modeling, Logic, Chromium, Lithography, SRAF, Metrology, Immersion lithography

Proceedings Article | 23 September 2013 Paper
Proceedings Volume 8880, 88800E (2013) https://doi.org/10.1117/12.2027307
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Optical proximity correction, SRAF, Defect detection, Lithography, Critical dimension metrology, Opacity

Showing 5 of 35 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top