Dr. Michael Hibbs
Senior Engineer
SPIE Involvement:
Author
Publications (35)

SPIE Journal Paper | 9 June 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Image registration, Birefringence, Pulsed laser operation, Inspection, Calibration, Metrology, Overlay metrology

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Defect detection, Databases, Inspection, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 8 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Multilayers, Image processing, Inspection, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Mask making, Semiconducting wafers

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Metrology, Logic, Data modeling, Chromium, Photomasks, Immersion lithography, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Reticles, Defect detection, Opacity, Inspection, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

Showing 5 of 35 publications
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