Michael Hoffman
Business Development
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 April 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Semiconductors, Lithography, Defect detection, Inspection, Scanning electron microscopy, Optical inspection, Bridges, Optical proximity correction, Semiconducting wafers, Design for manufacturability

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Optical design, Statistical analysis, Error analysis, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Computer aided design, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Metrology, Error analysis, Inspection, Electron microscopes, Distortion, Scanning electron microscopy, Optical inspection, Photomasks, Optical proximity correction, Critical dimension metrology

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