Michael Jurisch
at Institut für Mikroelektronik Stuttgart
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Etching, Electrodes, Tungsten, Silicon, Projection systems, Photomasks, Semiconducting wafers, Nanofabrication, Projection devices

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Nanostructures, Electron beams, Electronics, Particles, Ions, Silicon, Photomasks, Semiconducting wafers, Nanofabrication

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Oxides, Lithography, Etching, Electrodes, Silicon, 3D metrology, Photomasks, Beam shaping, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | October 20, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Switching, Etching, Electrodes, Silicon, Aluminum, Mask making, Optical alignment, Line edge roughness, Semiconducting wafers

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