Michael Kocsis
Principle Engineer at Inpria Corp
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 26 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Oxides, Lithography, Optical lithography, Metals, Scanners, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 5 May 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Metals, Manufacturing, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, System on a chip

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII

Proceedings Article | 25 March 2019 Presentation
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Oxides, Logic, Optical lithography, Etching, Metals, Manufacturing, Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Absorption

Showing 5 of 25 publications
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