Dr. Michael J. Kotelyanskii
PhD Senior Technologies at Rudolph Technologies Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 16 April 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Amorphous silicon, Refractive index, Metrology, Data modeling, Scatterometry, Precision measurement, Finite element methods, Critical dimension metrology, Semiconducting wafers, Statistical modeling

Proceedings Article | 16 April 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Amorphous silicon, Oxides, Ellipsometry, Metrology, Statistical analysis, Deep ultraviolet, Spectroscopy, Silicon, Photoresist materials, Optical metrology

Proceedings Article | 25 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Laser scattering, Transmission electron microscopy, Scatterometry, Optical metrology, Process control, Dysprosium, Reflectance spectroscopy, Critical dimension metrology, Semiconducting wafers

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