Dr. Michael Krumrey
at Physikalisch Technische Bundesanstalt
SPIE Involvement:
Author
Publications (65)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Extreme ultraviolet, Pellicles, Transmittance, Photomasks, Extreme ultraviolet lithography, EUV optics, Reflectivity, Carbon, Wafer-level optics, Particles

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Metrology, Scattering, Laser scattering, X-rays, Scatter measurement, Grazing incidence, Semiconductors, Semiconducting wafers, Absorption, Time metrology

PROCEEDINGS ARTICLE | September 8, 2017
Proc. SPIE. 10399, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII
KEYWORDS: X-rays, X-ray optics, Optics manufacturing, Metrology, Silicon, Sensors, X-ray characterization, X-ray detectors, Geometrical optics, Algorithm development

PROCEEDINGS ARTICLE | August 29, 2017
Proc. SPIE. 10399, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII
KEYWORDS: Mirrors, X-ray optics, Silicon, Optics manufacturing, Wafer-level optics, X-ray astronomy, Semiconducting wafers, Astronomical imaging, X-ray telescopes, Spatial resolution

PROCEEDINGS ARTICLE | August 29, 2017
Proc. SPIE. 10399, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII
KEYWORDS: Telescopes, X-ray optics, Silicon, X-ray telescopes, X-ray astronomy, X-rays, High energy astrophysics, Semiconductors, Spatial resolution, Mirrors

PROCEEDINGS ARTICLE | August 29, 2017
Proc. SPIE. 10399, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII
KEYWORDS: X-rays, Mirrors, Mirror structures, Optical alignment, Metrology, Titanium, Interfaces, Aluminum, X-ray optics, Manufacturing

Showing 5 of 65 publications
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