Dr. Michael C. Lam
Principal Engineer at Mentor, a Siemens Business
SPIE Involvement:
Senior status | Author
Publications (28)

Proceedings Article | 4 April 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Coastal modeling, Cadmium, Data modeling, Calibration, Neural networks, Machine learning, Optical proximity correction, Systems modeling, Process modeling

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Scanners, Error analysis, Manufacturing, Wavefronts, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Tolerancing

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Wafer-level optics, Finite-difference time-domain method, Scanners, Projection systems, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Electromagnetism, Systems modeling

SPIE Journal Paper | 19 August 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Wafer-level optics, Finite-difference time-domain method, Extreme ultraviolet, Systems modeling, Scanners, Extreme ultraviolet lithography, Projection systems

SPIE Journal Paper | 25 July 2017
JM3 Vol. 16 Issue 03

Showing 5 of 28 publications
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