Michael Lang
at KLA GmbH
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Contamination, Sensors, Air contamination, Crystals, Inspection, Wafer inspection, Photomasks, SRAF, Semiconducting wafers

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Contamination, Defect detection, Detection and tracking algorithms, Inspection, Wafer inspection, Photomasks, SRAF, Semiconducting wafers, Signal detection, Defect inspection

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Contamination, Databases, Manufacturing, Inspection, Photomasks, Stereolithography, Astatine, Defect inspection

Proceedings Article | 16 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Contamination, Defect detection, Modulation, Databases, Quartz, Inspection, Photomasks, Environmental sensing, Stereolithography, Defect inspection

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Reticles, Contamination, Stars, Defect detection, Detection and tracking algorithms, Optical properties, Inspection, Photomasks, Dysprosium, Defect inspection

Showing 5 of 9 publications
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