Dr. Michael J. Leeson
Senior Research Scientist at Intel Corp
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Author
Publications (30)

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Capillaries, Image processing, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Photoresist developing, Liquids

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Imaging systems, Polymers, Electrons, Ions, Atomic force microscopy, Scanning electron microscopy, Scanning helium ion microscopy, Photomasks, Picosecond phenomena, Neodymium

Proceedings Article | 19 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Nanoparticles, Etching, Particles, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: FT-IR spectroscopy, Optical lithography, Nanoparticles, Metals, Spectroscopy, Ultraviolet radiation, Particles, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Reticles, Surface roughness, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Line edge roughness, Semiconducting wafers, Plasma

Showing 5 of 30 publications
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