Dr. Michael W. Legenza
at Air Products and Chemicals Inc
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | April 6, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Etching, Image processing, Scanning electron microscopy, Line width roughness, Immersion lithography, Optical proximity correction, Line edge roughness, Photoresist processing, Semiconducting wafers

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