Mr. Michael R. Lenahan Profile

Michael R. Lenahan

at GLOBALFOUNDRIES

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Author

Publications (5)

Proceedings Article | 28 March 2017 Presentation + Paper

Optical metrology strategies for inline 7nm CMOS logic product control

Michael Lenahan, Sridhar Mahendrakar, Alok Vaid, Taher Kagalwala, Kartik Venkataraman, Dawei Hu, Ming Di, Da Song, Janay Camp, Zhou Ren, Nam Hee Yoon

Proceedings Volume 10145, 101451D (2017) https://doi.org/10.1117/12.2260491

KEYWORDS: Semiconducting wafers, Metrology, Fiber optic gyroscopes, Diffractive optical elements, Dielectrics, Dielectrophoresis, Metals, Process control, Personal digital assistants, Electrons

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SPIE Journal Paper | 25 October 2016

Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference

Taher Kagalwala, Alok Vaid, Sridhar Mahendrakar, Michael Lenahan, Fang Fang, Paul Isbester, Michael Shifrin, Yoav Etzioni, Aron Cepler, Naren Yellai, Prasad Dasari, Cornel Bozdog

JM3, Vol. 15, Issue 04, 044004, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.044004

KEYWORDS: Semiconducting wafers, Metrology, Optical lithography, Scatterometry, Critical dimension metrology, Finite element methods, Scatter measurement, Diffractive optical elements, Transmission electron microscopy, Reactive ion etching

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Proceedings Article | 24 March 2016 Paper

Scatterometry-based metrology for SAQP pitch walking using virtual reference

Taher Kagalwala, Alok Vaid, Sridhar Mahendrakar, Michael Lenahan, Fang Fang, Paul Isbester, Michael Shifrin, Yoav Etzioni, Aron Cepler, Naren Yellai, Prasad Dasari, Cornel Bozdog

Proceedings Volume 9778, 97781W (2016) https://doi.org/10.1117/12.2228329

KEYWORDS: Transmission electron microscopy, Metrology, Optical lithography, Scatterometry, Reactive ion etching, Etching, Semiconducting wafers, Diffractive optical elements, Critical dimension metrology, Scatter measurement

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Proceedings Article | 24 March 2016 Paper

Hybrid enabled thin film metrology using XPS and optical

Alok Vaid, Givantha Iddawela, Sridhar Mahendrakar, Michael Lenahan, Mainul Hossain, Padraig Timoney, Abner Bello, Cornel Bozdog, Heath Pois, Wei Ti Lee, Mark Klare, Michael Kwan, Byung Cheol Kang, Paul Isbester, Matthew Sendelbach, Naren Yellai, Prasad Dasari, Tom Larson

Proceedings Volume 9778, 97780M (2016) https://doi.org/10.1117/12.2220299

KEYWORDS: Metrology, Thin films, X-rays, X-ray optics, Semiconducting wafers, Wafer-level optics, Process control, Ellipsometry, Diffractive optical elements, Deposition processes, Optical testing, Dielectrics, Optical properties

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Proceedings Article | 18 March 2016 Paper

Optical metrology solutions for 10nm films process control challenges

Sridhar Mahendrakar, Alok Vaid, Kartik Venkataraman, Michael Lenahan, Steven Seipp, Fang Fang, Shweta Saxena, Dawei Hu, Nam Hee Yoon, Da Song, Janay Camp, Zhou Ren

Proceedings Volume 9778, 97780Z (2016) https://doi.org/10.1117/12.2220462

KEYWORDS: Metrology, Process control, Metals, Transistors, Dielectrics, X-ray optics, Tolerancing, Thin films, Control systems, 3D acquisition, Semiconducting wafers, Germanium, Lamps, Silicon, Light sources, 3D metrology

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