Dr. Michael J. Lercel
Director Strategic Marketing
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Author
Publications (42)

Proceedings Article | 10 October 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Reticles, Statistical analysis, Deep ultraviolet, Scanners, Manufacturing, Inspection, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Statistical modeling

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Reticles, Scanners, Particles, Pellicles, Extreme ultraviolet, Particle contamination, Plasma

Proceedings Article | 25 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Optical lithography, Statistical analysis, Manufacturing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Yield improvement, Statistical modeling, Factor analysis

Proceedings Article | 2 October 2014
Proc. SPIE. 9236, Scanning Microscopies 2014
KEYWORDS: Signal to noise ratio, Scattering, Light scattering, Inspection, Interference (communication), Scanning electron microscopy, Semiconducting wafers, Signal detection, Contrast transfer function, Defect inspection

SPIE Journal Paper | 29 June 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

Showing 5 of 42 publications
Conference Committee Involvement (13)
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Showing 5 of 13 Conference Committees
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