Michael Linnane
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Digital filtering, Chemistry, Manufacturing, Optics manufacturing, Yield improvement, Back end of line

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Contamination, Chemistry, Manufacturing, Inspection, Frequency modulation, Fermium, Photoresist processing, Semiconducting wafers, Tolerancing

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Contamination, Statistical analysis, Coating, Manufacturing, Photoresist materials, Frequency modulation, Fermium, Semiconducting wafers, Wafer testing, Industrial chemicals

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