Michael E. Littau
Research Scientist at Nanometrics Inc
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Diffraction, Polarization, Silicon, Clouds, Atomic force microscopy, Scatterometry, Domes, Critical dimension metrology, Scatter measurement

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Optical properties, Etching, Metals, Dielectrics, Atomic force microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers, Back end of line

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Diffraction, Metrology, Polarization, Etching, Light scattering, Scatterometry, Measurement devices, Analytical research, Critical dimension metrology

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, 3D applications, Scattering, 3D modeling, Scanning electron microscopy, Scatterometry, 3D metrology, Process control, Semiconducting wafers, Scatter measurement

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Etching, Polymers, Metals, Scanning electron microscopy, Scatterometry, Profilometers, Critical dimension metrology, Semiconducting wafers, Tin

Showing 5 of 15 publications
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