Dr. Michael J. May
at CEA-LETI
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Data modeling, Calibration, Silicon, Coating, Manufacturing, Scanning electron microscopy, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 March 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Metrology, Data modeling, Silicon, Coating, Manufacturing, Scanning electron microscopy, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 10 April 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Lithography, Electron beam lithography, Etching, Line width roughness, Directed self assembly, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, System on a chip

Proceedings Article | 12 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: FT-IR spectroscopy, Etching, Argon, Dry etching, Polymers, Chemistry, Resistance, Photoresist materials, Chemical analysis, Plasma

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Oxides, FT-IR spectroscopy, Etching, Polymers, Ions, Resistance, Plasma etching, Chemical analysis, Reactive ion etching, Plasma

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