The effect of oxygen partial pressure on the properties of Al2O3 films deposited by electron beam evaporation has been
investigated through a combination of spectrophotometric and interferometric characterization techniques. As oxygen partial
pressure increases, a decrease in the refractive index is observed, as well as a shift towards less tensile films once they are
exposed to ambient conditions. This decrease in tensile stress was observed to be correlated with water content in the films.
Increasing oxygen partial pressure during deposition improved film stoichiometry, absorption, and laser induced damage
threshold (LIDT) at 351 nm.
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