Mr. Michael Pomerantsev
at Mentor Graphics
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Data modeling, Computer simulations, Photomasks, Optical proximity correction, Mask making, Computer aided design, Reactive ion etching, Model-based design, Process modeling

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Modulation, Etching, Image processing, Photomasks, Computational lithography, Optical proximity correction, Convolution, Mask making, Model-based design, Process modeling

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