Michael Pomerantsev
Software Engineer at D2S Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 31 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 25 October 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Electronics, Data modeling, Image segmentation, Image processing, Manufacturing, Scanning electron microscopy, Neural networks, Photomasks, Computer aided design, Network architectures

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Modulation, Etching, Image processing, Photomasks, Computational lithography, Optical proximity correction, Convolution, Mask making, Model-based design, Process modeling

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Data modeling, Computer simulations, Photomasks, Optical proximity correction, Mask making, Computer aided design, Reactive ion etching, Model-based design, Process modeling

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