Dr. Michael T. Postek
RETIRED at
SPIE Involvement:
Publications Committee | Symposia Committee | Fellow status | Conference Program Committee | Symposium Committee | Conference Chair | Symposium Chair | Author | Editor | Instructor
Publications (101)

PROCEEDINGS ARTICLE | August 31, 2017
Proc. SPIE. 10354, Nanoengineering: Fabrication, Properties, Optics, and Devices XIV
KEYWORDS: Metrology, Polymers, Crystals, Ionizing radiation, Composites, Manufacturing, Nanomaterials, Nanocrystals, Carbon monoxide, Standards development

SPIE Journal Paper | December 15, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Metrology, Scanning electron microscopy, Atomic force microscopy, Error analysis, Calibration, 3D metrology, Image segmentation, Optical proximity correction, Lithography, Composites

PROCEEDINGS ARTICLE | September 15, 2016
Proc. SPIE. 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII
KEYWORDS: Signal to noise ratio, Electron beams, Metrology, Image processing, Image acquisition, Interference (communication), Scanning electron microscopy, Image quality, Photomicroscopy, Signal detection

SPIE Conference Volume | November 13, 2015

PROCEEDINGS ARTICLE | October 21, 2015
Proc. SPIE. 9636, Scanning Microscopies 2015
KEYWORDS: Electron beams, Metrology, Contamination, Sensors, Microscopy, Coating, Electron microscopes, Scanning electron microscopy, Photomicroscopy, Particle beams

PROCEEDINGS ARTICLE | August 20, 2015
Proc. SPIE. 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII
KEYWORDS: Electron beams, Metrology, Contamination, Sensors, Coating, Electron microscopes, Scanning electron microscopy, Photomicroscopy, Particle beams, Electroluminescent displays

Showing 5 of 101 publications
Conference Committee Involvement (46)
Nanoengineering: Fabrication, Properties, Optics, and Devices XV
19 August 2018 | San Diego, California, United States
Nanoengineering: Fabrication, Properties, Optics, and Devices XIV
9 August 2017 | San Diego, California, United States
Nanoengineering: Fabrication, Properties, Optics, and Devices XIII
30 August 2016 | San Diego, California, United States
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
Scanning Microscopies 2015
29 September 2015 | Monterey, California, United States
Showing 5 of 46 published special sections
Course Instructor
SC105: CD Metrology and Image Formation in the Scanning Electron Microscope (SEM)
The scanning electron microscope (SEM) is used extensively in semiconductor production as a measurement tool for inspection and critical dimension (CD) metrology. Improved images and measurements can be obtained and interpreted better by studying the details of the image-formation process. Non-mathematical explanations of the basic principles will allow the participant to get the best possible information from the specimen. There is also a discussion of how to get the most accurate measurements with this instrument.
SC954: Scanning Microscopy in Forensic Science
This one day short course will be devoted to the use of scanning microscopies including scanning electron microscopy (SEM), scanning optical profilometry, and energy dispersive x-ray (EDS) and x-ray fluorescence (XRF) spectrometry to forensic sample analyses including counter terrorism, explosives, pyrotechnics, counterfeit drugs and food and product tampering. The course is presented in four sections. Section one will provide the students with an understanding of the value and pitfalls of relying on instrument software in the examination of varying samples types and analysis conditions. Emphasis will be place on issues of instrument quality assurance including calibration, operation and understanding your instrument's data and compliance with certification organizations including ISO and ASCLD/LAB. Section two will be devoted to a presentation of sample handling and preparation as well as "unknown white powder" case analyses and other cases involving counterfeit drugs, food and product tampering. Section three will cover the issues of gunshot residue (GSR) analysis and more "unknown white powder" analyses related to pyrotechnic devices and flares as well as a presentation on improvised acid/foil bombs. Section four will include additional approaches to the analyses of "unknown white powder" cases so common today, the capabilities of a forensic laboratory in supporting emergency responders, and a number of illustrative case histories. Additional topics may cover a Scientific Working Group on Gun Shot Residue (SWGGSR) update report and perspective on instant shooter GSR kits. This course will be jointly presented by four instructors, all recognized experts in their respective area of scanning microscopy and applications to forensic science.
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