Dr. Michael Purvis
at Cymer LLC
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Extreme ultraviolet, High volume manufacturing

Proceedings Article | 10 May 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Plasma, Tin, High volume manufacturing, Semiconducting wafers, Reflectivity, EUV optics, Photoresist materials

Proceedings Article | 5 May 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Lithography, Current controlled current source

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Plasma, Optical simulations, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Carbon dioxide lasers, Performance modeling, Tin, Plasma physics, Optical lithography, Liquids, Laser development, Absorption, Monte Carlo methods, Computer simulations

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet, Overlay metrology, Extreme ultraviolet lithography, Manufacturing, Pellicles, Logic devices, Semiconducting wafers, Reticles, Photomasks, Scanners, Fiber optic illuminators, Tin

Proceedings Article | 16 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Extreme ultraviolet, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Plasma, Amplifiers, High power lasers, Tin, Laser energy, High volume manufacturing

Showing 5 of 7 publications
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