Michael Reilly
Principal Engineer Photolithography at Rohm and Haas Electronic Materials, LLC
SPIE Involvement:
Publications (40)

Proceedings Article | 29 March 2013 Paper
Proceedings Volume 8682, 86820G (2013) https://doi.org/10.1117/12.2011639
KEYWORDS: Polymers, Lithography, Computer simulations, Polymethylmethacrylate, Photoresist materials, Semiconducting wafers, Photoresist processing, Chemical analysis, Wafer-level optics, Directed self assembly

Proceedings Article | 20 March 2012 Paper
Michael Reilly, Cecily Andes, Thomas Cardolaccia, Young Seok Kim, Jong Keun Park
Proceedings Volume 8325, 832507 (2012) https://doi.org/10.1117/12.916633
KEYWORDS: Photoresist developing, Photoresist materials, Chemistry, Lithography, Photomasks, Line width roughness, Polymers, Printing, Semiconducting wafers, Critical dimension metrology

Proceedings Article | 16 April 2011 Paper
Michael Reilly, James Cameron, Sabrina Wong, Adam Ware
Proceedings Volume 7972, 79722O (2011) https://doi.org/10.1117/12.880982
KEYWORDS: Image processing, Interfaces, Reflection, Photoresist processing, Data modeling, Silicon, Scanning electron microscopy, Polymers, Semiconducting wafers, Ions

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 797206 (2011) https://doi.org/10.1117/12.882843
KEYWORDS: Photoresist developing, Photoresist materials, Polymers, Systems modeling, Semiconducting wafers, Optical lithography, Optical proximity correction, Photomasks, Etching, Nanoimprint lithography

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79720Y (2011) https://doi.org/10.1117/12.879506
KEYWORDS: Image processing, Systems modeling, Data modeling, Photoresist processing, Neodymium, Image quality, Photoresist developing, Photoresist materials, Lithography, Polymers

Showing 5 of 40 publications
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