Michael Reilly
Principal Engineer Photolithography at Dow Advanced Materials
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Publications (40)

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Wafer-level optics, Lithography, Polymethylmethacrylate, Polymers, Computer simulations, Photoresist materials, Directed self assembly, Chemical analysis, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Chemistry, Printing, Photoresist materials, Photomasks, Line width roughness, Critical dimension metrology, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Data modeling, Reflection, Polymers, Image processing, Interfaces, Ions, Silicon, Scanning electron microscopy, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Etching, Polymers, Photoresist materials, Photomasks, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, Systems modeling, Photoresist developing

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Data modeling, Polymers, Interfaces, Diffusion, Photoresist materials, Neodymium, Semiconducting wafers, Photoresist developing, Absorption

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Data modeling, Polymers, Image processing, Photoresist materials, Image quality, Neodymium, Photoresist processing, Systems modeling, Photoresist developing

Showing 5 of 40 publications
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