Michael L. Rieger
Consultant at Rieger Strategic Innovation, LLC
SPIE Involvement:
Conference Program Committee | Author
Publications (36)

SPIE Journal Paper | 26 November 2019 Open Access
JM3, Vol. 18, Issue 04, 040902, (November 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.4.040902
KEYWORDS: Transistors, Lithography, Very large scale integration, Clocks, Switching, Capacitance, Photomasks, Silicon, Logic, Resolution enhancement technologies

SPIE Journal Paper | 1 March 2012
JM3, Vol. 11, Issue 1, 013003, (March 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013003
KEYWORDS: Lithography, Photomasks, Optical lithography, Communication theory, Image processing, Channel projecting optics, Materials processing, Double patterning technology, Extreme ultraviolet, Diffraction

Proceedings Article | 4 April 2007 Paper
Rick Farnbach, Josh Tuttle, Matt St. John, Randy Brown, Dave Gerold, Kevin Lucas, Robert Lugg, James Shiely, Mike Rieger
Proceedings Volume 6520, 65204F (2007) https://doi.org/10.1117/12.721593
KEYWORDS: Optical proximity correction, Computer simulations, Image segmentation, Semiconducting wafers, Control systems, Photomasks, Mathematical modeling, Manufacturing, Convolution, Image analysis

Proceedings Article | 27 March 2007 Paper
Proceedings Volume 6520, 65200N (2007) https://doi.org/10.1117/12.715166
KEYWORDS: Optical lithography, Optical proximity correction, Error analysis, Resolution enhancement technologies, SRAF, Lithography, OLE for process control, Photomasks, Manufacturing, Metrology

Proceedings Article | 5 May 2005 Paper
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600180
KEYWORDS: Optical proximity correction, Tolerancing, Silicon, Process modeling, Metals, Image processing, Manufacturing, Yield improvement, Critical dimension metrology, Printing

Showing 5 of 36 publications
Proceedings Volume Editor (4)

Conference Committee Involvement (23)
DTCO and Computational Patterning IV
23 February 2025 | San Jose, California, United States
DTCO and Computational Patterning III
26 February 2024 | San Jose, California, United States
DTCO and Computational Patterning II
27 February 2023 | San Jose, California, United States
DTCO and Computational Patterning
26 April 2022 | San Jose, California, United States
Design-Technology Co-optimization XV
22 February 2021 | Online Only, California, United States
Showing 5 of 23 Conference Committees
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