Michael L. Rieger
Consultant at
SPIE Involvement:
Senior status | Conference Program Committee | Conference Chair | Author
Publications (39)

SPIE Journal Paper | 1 March 2012
JM3 Vol. 11 Issue 1
KEYWORDS: Lithography, Photomasks, Optical lithography, Communication theory, Image processing, Channel projecting optics, Materials processing, Double patterning technology, Extreme ultraviolet, Diffraction

Proceedings Article | 4 April 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Mathematical modeling, Image segmentation, Manufacturing, Control systems, Computer simulations, Image analysis, Photomasks, Optical proximity correction, Convolution, Semiconducting wafers

Showing 5 of 39 publications
Conference Committee Involvement (15)
Design-Process-Technology Co-optimization for Manufacturability XI
1 March 2017 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability X
24 February 2016 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability IX
25 February 2015 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability VIII
26 February 2014 | San Jose, California, United States
Design for Manufacturability through Design-Process Integration VII
27 February 2013 | San Jose, California, United States
Showing 5 of 15 published special sections
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