Michael R. Schmidt
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Femtosecond phenomena, Imaging systems, Opacity, Quartz, Manufacturing, Laser applications, Photomasks, Semiconducting wafers, Laser systems engineering

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Multilayers, Etching, Silicon, Inspection, Reflectivity, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 18 December 1998 Paper
Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Wafer-level optics, Metrology, Opacity, Distortion, Optical testing, Scanning electron microscopy, Optical metrology, Photomasks, Critical dimension metrology, Semiconducting wafers

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