Michael Sendler
President, US & EU Operations at Nova Measuring Instruments Inc
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | 1 October 2011
Alok Vaid, Bin Bin Yan, Yun Tao Jiang, Mark Kelling, Carsten Hartig, John Allgair, Peter Ebersbach, Matthew Sendelbach, Narender Rana, Ahmad Katnani, Erin McLellan, Charles Archie, Cornel Bozdog, Helen Kim, Michael Sendler, Susan Ng, Boris Sherman, Boaz Brill, Igor Turovets, Ronen Urensky
JM3, Vol. 10, Issue 04, 043016, (October 2011) https://doi.org/10.1117/12.10.1117/1.3655726
KEYWORDS: Metrology, Scatterometry, Critical dimension metrology, Semiconducting wafers, Data modeling, Atomic force microscopy, Transmission electron microscopy, Inspection, 3D metrology

Proceedings Article | 29 March 2011 Paper
Proceedings Volume 7971, 797103 (2011) https://doi.org/10.1117/12.881632
KEYWORDS: Metrology, Critical dimension metrology, Scatterometry, Semiconducting wafers, Metals, Transmission electron microscopy, Data modeling, Atomic force microscopy, Inspection

SPIE Journal Paper | 1 October 2010
Alok Vaid, Matthew Sendelbach, Daniel Moore, Timothy Brunner, Nelson Felix, Pawan Rawat, Cornel Bozdog, Hyang Kyun Kim, Michael Sendler, Stanislav Stepanov, Victor Kucerov
JM3, Vol. 9, Issue 04, 041306, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514707
KEYWORDS: Scatterometry, Semiconducting wafers, Optical properties, Critical dimension metrology, Optical testing, Finite element methods, Diffractive optical elements, Lithography, Data modeling, Metrology

Proceedings Article | 2 April 2010 Paper
Timothy Brunner, Michael Sendler, Matthew Sendelbach, Pawan Rawat, Alok Vaid, Cornel Bozdog, Daniel Moore, Stanislav Stepanov, Helen Kim, Nelson Felix, Victor Kucerov
Proceedings Volume 7638, 76381H (2010) https://doi.org/10.1117/12.846648
KEYWORDS: Scatterometry, Finite element methods, Semiconducting wafers, Optical properties, Critical dimension metrology, Diffractive optical elements, Metrology, Data modeling, Optical testing, Scatter measurement

Proceedings Article | 23 March 2009 Paper
Michael Sendler, Stanislav Stepanov, Yoel Cohen, Victor Kucherov, Boaz Brill, Matthew Sendelbach, Carsten Hartig, Hyang Kyun Kim, Cornel Bozdog, Alok Vaid
Proceedings Volume 7272, 72720V (2009) https://doi.org/10.1117/12.814380
KEYWORDS: Scatterometry, Material characterization, Optical properties, Semiconducting wafers, Metals, Critical dimension metrology, Etching, Silicon, Metrology, Wafer-level optics

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