Michael Sendler
at Nova Measuring Instruments Inc
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | October 1, 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Metrology, Scatterometry, Critical dimension metrology, Semiconducting wafers, Data modeling, Atomic force microscopy, Transmission electron microscopy, Inspection, 3D metrology

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Data modeling, Metals, Inspection, Atomic force microscopy, Transmission electron microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | October 1, 2010
JM3 Vol. 9 Issue 04
KEYWORDS: Scatterometry, Semiconducting wafers, Optical properties, Critical dimension metrology, Optical testing, Finite element methods, Diffractive optical elements, Lithography, Data modeling, Metrology

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Diffractive optical elements, Data modeling, Optical properties, Optical testing, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Metrology, Optical properties, Etching, Metals, Silicon, Scatterometry, Critical dimension metrology, Semiconducting wafers, Material characterization

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