Dr. Michael S. Sevegney
Sr. Engineer at SAMSUNG Austin Semiconductor LLC
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Carbon, Lithography, Metrology, Microfluidics, Particles, Silicon, Chemistry, Solids, Chemical elements, Semiconducting wafers

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Error analysis, Hydrogen, Manufacturing, Inspection, Transducers, Molecular interactions, Electronic filtering, Semiconducting wafers, Radium

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconductors, Lithography, Microfluidics, Optical lithography, Particles, Manufacturing, Photoresist materials, Bridges, Ozone, Back end of line

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