Michael T. Sheehan
Technical Consultant
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Statistical analysis, Polymers, Light scattering, Materials processing, Control systems, Polymerization, Directed self assembly, Chemical analysis, Molecular self-assembly, Liquids

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Polymers, Photoresist materials, Microelectronics, Polymerization, Photomasks, Line width roughness, Directed self assembly, Photoresist developing

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Optical lithography, Polymers, Photoresist materials, Solids, Polymerization, Photomasks, Line width roughness, Sodium, Semiconducting wafers, Photoresist developing

Proceedings Article | 7 July 1997 Paper
Proc. SPIE. 3049, Advances in Resist Technology and Processing XIV
KEYWORDS: Lithography, Deep ultraviolet, Ultraviolet radiation, Manufacturing, Lamps, Chromophores, Excimer lasers, Absorbance, Analog electronics, Chemically amplified resists

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