Michael D. Shumway
at Intel Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Data modeling, Manufacturing, Photomasks, Beam shaping, Optical proximity correction, Manufacturing equipment, Model-based design, Vestigial sideband modulation

Proceedings Article | 20 May 2004 Paper
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Wafer-level optics, Gold, Spatial frequencies, Spatial filters, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

Proceedings Article | 14 May 2004 Paper
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Polymers, Manufacturing, Photoresist materials, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 16 June 2003 Paper
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Wafer-level optics, Diffraction, Spatial frequencies, Interferometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Diffraction gratings

Proceedings Article | 20 August 2001 Paper
Proc. SPIE. 4343, Emerging Lithographic Technologies V
KEYWORDS: Mirrors, Optical design, Polymethylmethacrylate, Spatial frequencies, Computer simulations, Printing, Objectives, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

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