Dr. Michael C. Smayling
SPIE Involvement:
Publications (38)

Proceedings Article | 22 March 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Electronics, Logic, Optical lithography, Optical resolution, Photomasks, Directed self assembly, Transistors, Source mask optimization, Optics manufacturing

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Etching, Metals, Computer programming, Scanning electron microscopy, Photomasks, Logic devices, Source mask optimization

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Logic, Optical lithography, Etching, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, Picosecond phenomena, Neodymium, Fiber optic illuminators

Proceedings Article | 16 September 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Databases, Image processing, Manufacturing, Scanning electron microscopy, Photomasks, Double patterning technology, Optical proximity correction, Critical dimension metrology, Optics manufacturing

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Calibration, Image processing, Manufacturing, Photomasks, Field effect transistors, Double patterning technology, Device simulation

Showing 5 of 38 publications
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